·Hiden在被動(dòng)射頻補(bǔ)償方面處于地位，在所有的商業(yè)化探針中 ESPion具有的屏蔽阻抗(4.25Mohm at 13.56 MHz cf. 100kohm) 
· 參考探針補(bǔ)償用于抵制較低頻率影響，例如等離子體電位漂移(如，反應(yīng)室內(nèi)腔陽極氧化所致) 或噪音(如，供電源引起)
· 高溫等離子體操作時(shí)的氣體制冷多感應(yīng)器鏈，使用者可調(diào)諧至其他頻率 

·獲得數(shù)據(jù)速度：     15scans/s，

·通過D-O-E-界面可以自動(dòng)/半自動(dòng)/手動(dòng)分析
·300、600、915mm 自動(dòng)線性驅(qū)動(dòng)器可選，互鎖隔離閥，

·90°探針，組合式線性－旋轉(zhuǎn)驅(qū)動(dòng)器可選
·ESPion 是所有商業(yè)化探針中速的脈沖等離子體探針，

·ESPsoft 包括所有必需的標(biāo)準(zhǔn)脈沖選通電路

·自清洗循環(huán)，防止探針污染
· 經(jīng)由RS232、RS485、Ethernet LAN 和 ESPsoft軟件控制

Mass Spectrometers for Thin Films, Plasma and Surface Engineering (1.1 MB)

AP0067 - O- Density Measurements in the Pulsed-DC Reactive Magnetron Sputtering of Titanium (215 KB)

AP0121 - Hiden ESPion Plasma Probe Measurements on a Hollow-Cathode Based Large-Volume Plasma Source (277 KB)

AP0142 - Ion Density Increase in High Power Twin-cathode Magnetron System (247 KB)

Energy/Mass Spectrometer Analyser and Langmuir Probe Diagnostics for HIPIMS (1.88 MB)

Mass Spectrometry in HiPIMS Plasmas - COST Workshop 2012 (3.2 MB)

Plasma Diagnostics in High Power Impulse Magnetron Sputtering Discharges - TIRI JSFS 2012 Tokyo YAG (3.52 MB)